Vytautas Magnus University Research Management System (VDU CRIS)
 
Use this url to cite publication: https://hdl.handle.net/20.500.12259/83771

Thin films mechanical properties of indium tin oxide annealed in oxygen environment

Type of publication
Straipsnis konferencijos medžiagoje Web of Science duomenų bazėje / Article in conference proceedings in Web of Science database (P1a1)
Author(s)
AuthorAffiliation
Užupis, Arnoldas
Žemės ūkio akademija / Agriculture Academy
LT
Girdauskienė, Dalia
Žemės ūkio akademija / Agriculture Academy
LT
Vengalis, Bonifacas
Title
Thin films mechanical properties of indium tin oxide annealed in oxygen environment
[en]
Is part of
Radiation interaction with material and its Use in technologies 2008 = Взаимодействие излучения с веществом и ее применение в технологии 2008 : international conference, Kaunas, Lithuania, 24-27 September, 2008 : program and materials. Kaunas : Technologija, 2008
Date Issued
Date
2008
Publisher
Kaunas : Technologija
Is Referenced by
Conference Proceedings Citation Index - Science (Web of Science)
Extent
p. 163-166
URI
URI
https://hdl.handle.net/20.500.12259/83771
Field of Science
Abstract (en)

Indium-Tin-Oxide (ITO) thin films were deposited on quartz Substrates using DC magnetron reactive sputtering at different Substrate temperatures. Residual stress in thin ITO films was investigated as a function of the technological conditions. The post-deposition annealing conditions were varied to define minimal residual stress of ITO films. We have found that with increases of oxygen content in the Film decreased residual stress of ITO thin films.

Type of document
type::text::journal::journal article::research article
Language
Anglų / English (en)
Coverage Spatial
Lietuva / Lithuania (LT)
ISSN (of the container)
1822-508X
WOS
WOS:000261333100043
Other Identifier(s)
VDU02-000045548