Please use this identifier to cite or link to this item:https://hdl.handle.net/20.500.12259/83771
Type of publication: Straipsnis konferencijos medžiagoje Clarivate Analytics Web of Science ar/ir Scopus / Article in Clarivate Analytics Web of Science or Scopus DB conference proceedings (P1a)
Field of Science: Fizika / Physics (N002)
Author(s): Užupis, Arnoldas;Girdauskienė, Dalia;Vengalis, Bonifacas;Lisauskas, Vaclovas
Title: Thin films mechanical properties of indium tin oxide annealed in oxygen environment
Is part of: Radiation interaction with material and its Use in technologies 2008 = Взаимодействие излучения с веществом и ее применение в технологии 2008 : international conference, Kaunas, Lithuania, 24-27 September, 2008 : program and materials. Kaunas : Technologija, 2008
Extent: p. 163-166
Date: 2008
Abstract: Indium-Tin-Oxide (ITO) thin films were deposited on quartz Substrates using DC magnetron reactive sputtering at different Substrate temperatures. Residual stress in thin ITO films was investigated as a function of the technological conditions. The post-deposition annealing conditions were varied to define minimal residual stress of ITO films. We have found that with increases of oxygen content in the Film decreased residual stress of ITO thin films
Internet: https://hdl.handle.net/20.500.12259/83771
Affiliation(s): Vytauto Didžiojo universitetas
Žemės ūkio akademija
Appears in Collections:Universiteto mokslo publikacijos / University Research Publications

Files in This Item:
marc.xml5.91 kBXMLView/Open

MARC21 XML metadata

Show full item record
Export via OAI-PMH Interface in XML Formats
Export to Other Non-XML Formats


CORE Recommender

Page view(s)

52
checked on Mar 31, 2020

Download(s)

8
checked on Mar 31, 2020

Google ScholarTM

Check


Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.