Preparation of hydrogenated-TiO2/Ti double layered thin films by water vapor plasma treatment

Please use this identifier to cite or link to this item:https://hdl.handle.net/20.500.12259/54382

Type of publication:	Straipsnis Clarivate Analytics Web of Science ar/ir Scopus / Article in Clarivate Analytics Web of Science or / and Scopus (S1)
Field of Science:	Fizika / Physics (N002)
Author(s):	Pranevičius, Liudas;Milčius, Darius;Tučkutė, Simona;Gedvilas, Karolis
Title:	Preparation of hydrogenated-TiO2/Ti double layered thin films by water vapor plasma treatment
Is part of:	Applied surface science. Amsterdam : Elsevier Science B.V., 2012, vol. 258, iss. 22
Extent:	p. 8619-8622
Date:	2012
Keywords:	Ti films;Water vapor;Plasma
Abstract:	We have investigated the structural and compositional variations in 200-500 nm thick Ti films deposited by magnetron sputter-deposition technique and treated in water vapor plasma at different processing powers. It was found that the upper layer of treated film with the thickness of 110 nm was changed into the black hydrogenated-TiO2 with around 16 nm sized nanocystals during 10 min for dissipated power 200 W at room temperature. Analysis of the experimental results is used to obtain insights into the effects of water layer adsorbed on hydrophilic oxidized titanium surfaces exposed to plasma radiation
Internet:	https://doi.org/10.1016/j.apsusc.2012.05.061 https://doi.org/10.1016/j.apsusc.2012.05.061
Affiliation(s):	Fizikos katedra Gamtos mokslų fakultetas Lietuvos energetikos institutas Vytauto Didžiojo universitetas
Appears in Collections:	Universiteto mokslo publikacijos / University Research Publications

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