Please use this identifier to cite or link to this item:https://hdl.handle.net/20.500.12259/48773
Type of publication: research article
Type of publication (PDB): Straipsnis Clarivate Analytics Web of Science / Article in Clarivate Analytics Web of Science (S1)
Field of Science: Fizika / Physics (N002)
Author(s): Pranevičius, Liudvikas;Milčius, Darius;Pranevičius, Liudas;Templier, Claude
Title: Hydrogenation of Mg thin films in CH4 + Ar plasmas
Is part of: Journal of non-crystalline solids. [Amsterdam] : Elsevier Science, 2010, Vol. 356, iss. 37-40
Extent: p. 1955-1957
Date: 2010
Keywords: Plasma implantation;Hydrogen separation;Hydrogenation
Abstract: Magnesium films were magnetron sputter deposited on AISI 316L stainless steel and hydrogenated at 450 K by the plasma immersion ion implantation technique using CH4 + Ar gases under a pressure of 10 Pa. The goal was to obtain hydrogen separation and formation of hydrides in Mg film thus avoiding a hydrogen gas purification process. The depth profiles of C and H atoms across the Mg film were analyzed by the Nuclear Reaction Analysis and secondary ion mass spectrometry. After 0.5 h of plasma treatment with a 1 kV bias voltage, C atoms remained in the near surface region while H atoms were homogeneously distributed across the entire film thickness. The results are explained on the basis of C and H ion implantation and atomic transport kinetics along the grain boundaries of a nanocrystalline Mg film
Internet: https://doi.org/10.1016/j.jnoncrysol.2010.05.036
Affiliation(s): Fizikos katedra
Gamtos mokslų fakultetas
Lietuvos energetikos institutas
Vytauto Didžiojo universitetas
Appears in Collections:Universiteto mokslo publikacijos / University Research Publications

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