Use this url to cite publication: https://hdl.handle.net/20.500.12259/44829
Study of different thickness titanium films treated by water vapour plasma
Type of publication
Konferencijų tezės nerecenzuojamame leidinyje / Conference theses in non-peer-reviewed publication (T2)
Author(s)
| Author | Affiliation | |
|---|---|---|
LT | ||
LT | ||
LT | ||
LT | ||
LT | ||
LT |
Title
Study of different thickness titanium films treated by water vapour plasma
Is part of
The vital nature sign [elektroninis išteklius] : 6th international scientific conference, Kaunas, Lithuania, 1-4 June, 2012 : abstract book. Kaunas : Vytautas Magnus university, 2012
Date Issued
| Date |
|---|
2012 |
Publisher
Kaunas : Vytautas Magnus university, 2012
Extent
p. 21-21
Abstract (en)
DC-magnetron sputtering technique was used to produce Ti films of different thicknesses on crystalline Si substrates. Oxidation of these films was performed by water vapour at pressure of 10 Pa. Plasma was generated using radio-frequency (RF) energy source. Experimental results indicate that the oxidation kinetics of Ti films depends on film thickness. XRD patterns of thin and thick Ti films oxidized under the same oxidation conditions reveal their different structure and phase composition. The mean surface roughness increases with the increase in titanium film thickness. The oxidation mechanism of Ti films with different thicknesses is discussed on the basis of the obtained experimental results.
Type of document
type::text::conference output::conference proceedings::conference paper
Language
Anglų / English (en)
Coverage Spatial
Lietuva / Lithuania (LT)
Other Identifier(s)
VDU02-000012298