Please use this identifier to cite or link to this item:https://hdl.handle.net/20.500.12259/44829
Type of publication: conference paper
Type of publication (PDB): Konferencijų tezės nerecenzuojamuose leidiniuose / Conference theses in non-peer-reviewed publications (T2)
Field of Science: Fizika / Physics (N002)
Author(s): Rajackas, Tomas;Urbonavičius, Marius;Tučkutė, Simona;Girdzevičius, Dalius;Gedvilas, Karolis;Pranevičius, Liudvikas
Title: Study of different thickness titanium films treated by water vapour plasma
Is part of: The vital nature sign [elektroninis išteklius] : 6th international scientific conference, Kaunas, Lithuania, 1-4 June, 2012 : abstract book. Kaunas : Vytautas Magnus university, 2012
Extent: p. 21-21
Date: 2012
Keywords: Ti film;Oxidation;Water vapor plasma
Abstract: DC-magnetron sputtering technique was used to produce Ti films of different thicknesses on crystalline Si substrates. Oxidation of these films was performed by water vapour at pressure of 10 Pa. Plasma was generated using radio-frequency (RF) energy source. Experimental results indicate that the oxidation kinetics of Ti films depends on film thickness. XRD patterns of thin and thick Ti films oxidized under the same oxidation conditions reveal their different structure and phase composition. The mean surface roughness increases with the increase in titanium film thickness. The oxidation mechanism of Ti films with different thicknesses is discussed on the basis of the obtained experimental results
Internet: https://hdl.handle.net/20.500.12259/44829
Affiliation(s): Fizikos katedra
Vytauto Didžiojo universitetas
Appears in Collections:Universiteto mokslo publikacijos / University Research Publications

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