Study of hydrogen behaviour in plasma treated titanium films

Please use this identifier to cite or link to this item:https://hdl.handle.net/20.500.12259/43751

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Type of publication:	research article
Type of publication (PDB):	Straipsnis konferencijos medžiagoje Clarivate Analytics Web of Science ar/ir Scopus / Article in Clarivate Analytics Web of Science or Scopus DB conference proceedings (P1a)
Field of Science:	Fizika / Physics (N002)
Author(s):	Girdzevičius, Dalius;Urbonavičius, Marius;Rajackas, Tomas
Title:	Study of hydrogen behaviour in plasma treated titanium films
Is part of:	Radiation interaction with material and its use in technologies 2012 : 4rd international conference, Kaunas, Lithuania, May 14-17, 2012 : program and materials. Kaunas : Tecnologija, 4 (2012)
Extent:	p. 119-122
Date:	2012
Keywords:	Electrical resistivity;Hydrogen;Water vapour plasma
Abstract:	Titanium oxide is well known, widely used and investigated material that shows unique physical and chemical properties. This paper deals with Ti thin films investigation regarding an effect of water vapour plasma immersion ion implantation technology. Samples are characterized using four probe resistivity method that shows the change of surface electrical conductivity. This parameter tells us about the formation of new phases (e.g. non-stoichiometric titanium oxide) or simply creation of possible defects which depend on presence of hydrogen
Internet:	https://hdl.handle.net/20.500.12259/43751
Affiliation(s):	Fizikos katedra Vytauto Didžiojo universitetas
Appears in Collections:	Universiteto mokslo publikacijos / University Research Publications