Use this url to cite publication: https://hdl.handle.net/20.500.12259/43632
Water vapour plasma oxidation effects on various thickness titanium films
Type of publication
Straipsnis konferencijos medžiagoje Web of Science duomenų bazėje / Article in conference proceedings in Web of Science database (P1a1)
Author(s)
| Author | Affiliation | |||
|---|---|---|---|---|
LT | ||||
LT | Lietuvos energetikos institutas | LT | ||
LT | ||||
LT |
Title
Water vapour plasma oxidation effects on various thickness titanium films
Is part of
Radiation interaction with material and its use in technologies 2012 : 4rd international conference, Kaunas, Lithuania, May 14-17, 2012 : program and materials. Kaunas : Tecnologija, 4 (2012)
Date Issued
| Date |
|---|
2012 |
Publisher
Kaunas : Tecnologija
Extent
p. 103-106
Abstract (en)
DC-magnetron sputtering technique was used to produce Ti films of different thicknesses on crystalline Si substrates. Oxidation of these films was performed by water vapour at pressure of 10 Pa. Plasma was generated using radio-frequency (RF) energy source. Experimental results indicate that the oxidation kinetics of Ti films depends on film thickness. XRD patterns of thin and thick Ti films oxidized under the same oxidation conditions reveal their different structure and phase composition. The mean surface roughness increases with the increase in titanium film thickness. The oxidation mechanism of Ti films with different thicknesses is discussed on the basis of the obtained experimental results.
Type of document
type::text::journal::journal article::research article
Language
Anglų / English (en)
Coverage Spatial
Lietuva / Lithuania (LT)
ISSN (of the container)
1822-508X
WOS
WOS:000308846300029
Other Identifier(s)
VDU02-000011931