Please use this identifier to cite or link to this item:https://hdl.handle.net/20.500.12259/42938
Type of publication: research article
Type of publication (PDB): Straipsnis recenzuojamoje Lietuvos konferencijos medžiagoje / Article in peer-reviewed Lithuanian conference proceedings (P1f)
Field of Science: Energetika ir termoinžinerija / Energetics and thermal engineering (T006)
Author(s): Barnackas, Irmantas;Bobrovaitė, Birutė
Title: Vandenilio elgsena Mg2Ni plonose dangose
Other Title: Behavior of Hydrogen in Mg2Ni Thin Films
Is part of: Jaunoji energetika 2005 [Elektroninis išteklius]: doktorantų ir jaunųjų mokslininkų konferencija, Kaunas, LEI, 2005 birželio 2 d. Kaunas, 2005
Extent: p. 1-4
Date: 2005
Keywords: Vandenilis;Plonos dangos
ISBN: 9986492912
Abstract: The Mg2Ni 1–3 μm layers were successfully deposited applying magnetron sputtering techniques. The deposited layers were hydrided using ions implantation from hydrogen plasma or the hydrided of the layers in hydrogen, in high pressure. On the basis of experimental results obtained using XRD, SEM and GDOES analytical techniques it was found that after the hydrogen plasma treatment Mg2Ni films were homogeneously enriched with hydrogen atoms through the film thickness and Mg2NiH0.3 was successfully formed. Up to now there are no successful results on Mg2NiH4 phase formation. This can be related to the desorption of hydrogen during the hydrogenation. After the hydrided of Mg2Ni thin films in hydrogen atmosphere, in high pressure, Mg2NiH4 thin films were successfully formed
Internet: https://hdl.handle.net/20.500.12259/42938
Affiliation(s): Vytauto Didžiojo universitetas
Appears in Collections:Universiteto mokslo publikacijos / University Research Publications

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