Please use this identifier to cite or link to this item:https://hdl.handle.net/20.500.12259/41226
Type of publication: research article
Type of publication (PDB): Straipsnis Clarivate Analytics Web of Science / Article in Clarivate Analytics Web of Science (S1)
Field of Science: Fizika / Physics (N002)
Author(s): Pranevičius, Liudas;Milčius, Darius;Barnackas, Irmantas;Nomgaudytė, Jurgita
Title: Behavior of hydrogen in Al, Mmg and MgAl plasma saturated films
Is part of: Solid state phenomena: Diffusion and defect data, Part B. Zurich-Uetikon, Switzerland : Trans Tech Publications, 2004, Vol. 97-98
Extent: p. 159-164
Date: 2004
Note: [6th International Conference on Self-Formation Theory and Applications Vilnius, Lithuania, Nov. 26-28, 2003]
Keywords: Thin films;Hydrogen storage;Vapor deposition;X-ray difraction
Abstract: The behaviors of hydrogen in Al, Mg and MgAl thin films on stainless steel substrate were investigated in this work. The hydrogen ions extracted from plasma were used to load hydrogen into the film material. Glow discharge optical emission spectroscopy (GDOES) was applied to obtain the hydrogen depth profiles in AL films versus hydriding parameters. The MgH2 , AlH3 and Mg(AlH4)2 hydrides were identified in plasma hydrided films using X-ray diffraction (XRD). It is shown that efficient supply transport of hydrogen from the surface into the bulk for Mg films takes place at temperature above 100oC and ion irradiation intensity above 1m A cm2
Internet: http://www.scientific.net/default.cfm?issn=1012-0394&pg=1
Affiliation(s): Lietuvos energetikos institutas, milcius@mail.lei.lt
Vytauto Didžiojo universitetas
Appears in Collections:Universiteto mokslo publikacijos / University Research Publications

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