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Type of publication: research article
Type of publication (PDB): Straipsnis recenzuojamoje užsienio tarptautinės konferencijos medžiagoje / Article in peer-reviewed foreign international conference proceedings (P1d)
Field of Science: Fizika / Physics (N002)
Author(s): Tučkutė, Simona;Pranevičius, Liudas;Pranevičius, Liudvikas;Urbonavičius, Marius
Title: Oxygen implantation and behaviour into Ti thin films from water vapour plasma
Is part of: Nanomaterials: application & properties: proceedings 1-st international conference, Alushta, Crimea, 27-30 Semptember 2011. Vol. 1, part II / ed. A. Pogrebnjak, T. Lyutyy, S. Protsenko. Sumy : SumDU Publishing, 2011
Extent: p. 390-396
Date: 2011
Keywords: Hydrogen;Water vapour;Plasma;Ion implantation
Abstract: The behavior of O atoms in Ti film is investigated under high-flux, low-energy molecular water ion implantation. After 10 min of irradiation at room temperature, the anomalously deep penetration of oxygen without formation of new chemical compounds observable by XRD has been registered in Ti films using Auger spectroscopy analysis. It is shown that the surface energy increases under ion irradiation, and the relaxation processes minimizing the surface energy initiate the redistribution of atoms. Two surface energy relaxation processes are considered: (i) the mixing of atoms on the surface resulting in annihilation of surface vacancies; and (ii) the annihilation of surface vacancies by atoms transported from the bulk. The theoretical considerations are in agreement with the experimental results if to assume that the mass-transport in the bulk is controlled by the processes on the surface and the adsorption of reactive atoms or molecules leads to local and long-range restructuring and adatom relocation at the surface
Affiliation(s): Fizikos katedra
Lietuvos energetikos institutas
Lietuvos energetikos institutas,
Vytauto Didžiojo universitetas
Appears in Collections:Universiteto mokslo publikacijos / University Research Publications

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