Modeling of water molecular ion implantation

Abstract

In this paper, we have studied theoretically the split of H2O molecules and separation of H atoms by the molecular ion implantation. It is shown by an analytical estimation of the projected ranges for hydrogen and oxygen atoms, and then, by the computer simulation by SRIM, that energetic water molecules are broken upon the entrance into Ti film and separated oxygen and hydrogen atoms are distributed in the near surface region with the similar depth distribution profiles. The modeling results are compared with the experimental ones. Registered discrepancies show that hydrogen diffusion processes have to be included. The formation of hydrogen from the water vapor by the molecular ion implantation has two main advantages: 1) hydrogen separation takes place in the range of low temperatures, and 2) process may be verified changing energy and intensity of ion irradiation.