Vytautas Magnus University Research Management System (VDU CRIS)
 
Use this url to cite publication: https://hdl.handle.net/20.500.12259/37328

Hydrogen storage properties of Ti-doped MgAl films

Type of publication
Straipsnis Web of Science ir Scopus duomenų bazėje / Article in Web of Science and Scopus database (S1)
Author(s)
AuthorAffiliation
Pranevičius, Liudvikas 
Fizikos katedra / Department of Physics 
LT
Milčius, Darius orcid-logo
Fizikos katedra / Department of Physics 
LT
Lietuvos energetikos institutas
Pranevičius, Liudas 
Fizikos katedra / Department of Physics 
LT
Templier, Claude
Université de Poitiers
Title
Hydrogen storage properties of Ti-doped MgAl films
[en]
Is part of
Przeglad elektrotechniczny = Electrical review
Date Issued
DateVolumeIssueStart PageEnd Page
2008
84
3
95
98
Publisher
Warszawa : SIGMA-NOT
Is Referenced by
Science Citation Index Expanded (Web of Science) 
Extent
p. 95-98
URI
URI
http://pe.org.pl/abstract_pl.php?nid=1381
https://hdl.handle.net/20.500.12259/37328
Field of Science
OECD Classification
Keywords (en)
Abstract (en)

The 2-5mu thick MgAl films with varying concentration of Ti have been hydrogenated employing plasma immersion ion implantation technique. It is shown that for Ti-doped film the dehydrogenation timeis 1.5 times shorter and the dehydrogenation temperature is 50 K less. When dehydrogenated MgAl film is exposed to air the major part of hydrogen effuses at similar to 630 K and the effusion process is controlled by the migration of hydrogen through the surface oxide layer.

Type of document
type::text::journal::journal article::research article
Language
Anglų / English (en)
Coverage Spatial
Lenkija / Poland (PL)
ISSN (of the container)
0033-2097
WOS
WOS:000256288600031
Other Identifier(s)
VDU02-000005174