Use this url to cite publication: https://hdl.handle.net/20.500.12259/37328
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Hydrogen storage properties of Ti-doped MgAl films
Type of publication
Straipsnis Web of Science duomenų bazėje / Article in Web of Science database (S1)
Author(s)
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Milčius, Darius
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Lietuvos energetikos institutas
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Templier, Claude
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Université de Poitiers
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Title
Hydrogen storage properties of Ti-doped MgAl films
Publisher
Warszawa : SIGMA-NOT
Date Issued
2008
Extent
p. 95-98
Is part of
Przeglad elektrotechniczny = Electrical review. Warszawa : SIGMA-NOT, 2008, Vol. 84, iss. 3
Field of Science
Abstract
The 2-5mu thick MgAl films with varying concentration of Ti have been hydrogenated employing plasma immersion ion implantation technique. It is shown that for Ti-doped film the dehydrogenation timeis 1.5 times shorter and the dehydrogenation temperature is 50 K less. When dehydrogenated MgAl film is exposed to air the major part of hydrogen effuses at similar to 630 K and the effusion process is controlled by the migration of hydrogen through the surface oxide layer.
Is Referenced by
Type of document
type::text::periodical::journal::contribution to journal::journal article::research article
ISSN (of the container)
0033-2097
WOS
WOS:000256288600031
Other Identifier(s)
VDU02-000005174
Coverage Spatial
Lenkija / Poland (PL)
Language
Anglų / English (en)
Bibliographic Details
8