Please use this identifier to cite or link to this item:https://hdl.handle.net/20.500.12259/116858
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dc.contributor.advisorJuzeliūnas, Eimutis-
dc.contributor.authorBarbaravičiūtė, Virginija-
dc.date.accessioned2020-12-22T15:20:46Z-
dc.date.available2020-12-22T15:20:46Z-
dc.date.issued2006-06-15-
dc.identifier.urihttps://hdl.handle.net/20.500.12259/116858-
dc.description.abstractThe aim of present work was to study corrosion properties of magnetron sputtered Mg–Al alloys and characterize semiconductor properties of the surface layers developed during corrosion. Atomic force microscopy (AFM) demonstrated that sputtered alloys had a smaller grain size and a smoother surface. Corrosion and electrochemical behaviour of the alloys was studied in 0,1M (NH4)3BO3 + 0,1M NaCl (pH = 8,4) solution. Sputtered films of Al-Mg and Al had a superior resistance to pitting corrosion when compared to cast counterparts. The corrosion resistance of sputtered samples increased with decrease in Mg content. The Mott – Schottky plots of Al-Mg and pure Al electrodes showed a linear relationship between modified capacitance (C-2) on applied potential. It was concluded n – type semiconductivity for the layers on Al and p – type for Al-Mg alloys.lt
dc.description.sponsorshipŠvietimo akademijalt
dc.description.sponsorshipVytauto Didžiojo universitetaslt
dc.format.extent47 p.-
dc.language.isolt-
dc.subjectEISlt
dc.subjectAFMlt
dc.subjectkorozijalt
dc.subjectmagnetroniniai plazminiai lydiniailt
dc.subject.otherChemija / Chemistry (N003)-
dc.titleMagnetroninių plazminių magnio lydinių elektrocheminis ir korozinis charakterizavimaslt
dc.title.alternativeElectrochemical and corrosion characterisation of magnetron sputtered Mg Alloysen
dc.typemaster thesis-
item.grantfulltextopen-
item.fulltextWith Fulltext-
Appears in Collections:VDU, ASU ir LEU iki / until 2018
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